Enhanced Screening in Epitaxial Graphene via Nearly Free-Electron Metal Intercalation

Graphene exhibits extraordinarily high carrier mobility, making it a promising platform for next-generation electronics. Scalable growth on SiC, however, suffers from limited dielectric screening at the graphene-substrate interface, degrading electronic performance. In this work, we systematically enhance dielectric screening by intercalating a bilayer of indium at the graphene-SiC interface. Using graphene's plasmaronic signature observed in angle-resolved photoemission spectroscopy as a proxy for interaction strength, we quantitatively demonstrate strong dielectric screening arising from the interplay of both indium layers. Layer-resolved density functional theory shows that the first indium layer acts as a buffer that absorbs substrate interactions, enabling the second layer to form a nearly free-electron system that efficiently screens the graphene layer above. Experiments with only a single intercalated indium layer reveal reduced screening, confirming the essential role of the second layer. Our results establish 2ML indium intercalation as a powerful route for engineering dielectric environments in graphene.